(PR-inside.com) - ASML Holding NV (ASML) (NASDAQ:ASML) (Amsterdam:ASML) today unveiled innovations in its TWINSCANTM lithography platform that offer significant improvements in overlay and productivity, enabling the semiconductor industry to continue its roadmap for more advanced and affordable chips. The TWINSCAN NXT platform, presented to the media at the ASML Research Review is also suited for emerging double patterning techniques which manufacturers need to shrink the smallest chip features by up to 42 percent. The TWINSCAN NXT platform features a new planar wafer stage design, extending the modular TWINSCAN architecture (of which almost 900 systems have been sold) for multiple generations ..
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