MELVILLE, N.Y, February 23, 2015 - Canon U.S.A. Inc., a leader in digital imaging solutions, today announced that its parent company, Canon Inc., is developing a next-generation semiconductor lithography system employing nanoimprint technology that makes possible sub-20 nm1 high-resolution processes. Within the leading-edge high-resolution patterning segment, where 193 nm multiple patterning has become mainstream and EUV (extreme ultraviolet)2 continues to remain in development, in 2004, Canon began conducting research into nanoimprint technology to achieve sub-20 nm high-resolution processes. Since 2009, targeting the mass production of next-generation semiconductor lithography systems employing nanoimprint technology, Canon Inc. has accelerated joint development efforts with Canon Nanotechnologies, Inc., which joined the Canon Group in April 2014, and a major semiconductor manufacturer. Thanks to such technological advances as the development of defect control technologies and improvements in alignment accuracy, Canon is aiming to commercialize a nanoimprint lithography system in 2015.
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Canon
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