MELVILLE, N.Y., October 1, 2024 – Canon Inc., the parent company of Canon U.S.A., Inc., a leader in digital imaging solutions, announced that it shipped its most advanced lithography platform, the FPA-1200NZ2C nanoimprint lithography (NIL) system for semiconductor manufacturing to the Texas Institute for Electronics (TIE), a Texas-based semiconductor consortium, on September 26, 2024. Canon became the...
The post Canon Inc. Delivers FPA -1200NZ2C Nanoimprint Lithography System for Semiconductor Manufacturing to the Texas Institute for Electronics appeared first on Industry Analysts, Inc..
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The post Canon Inc. Delivers FPA -1200NZ2C Nanoimprint Lithography System for Semiconductor Manufacturing to the Texas Institute for Electronics appeared first on Industry Analysts, Inc..
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