MAUI, HI -- (Marketwire) -- 06/28/10 -- Extreme ultraviolet lithography (EUVL) is the semiconductor industry's best bet for extending Moore's Law and its inherent advantages make it an increasingly preferable choice for next-generation patterning, ranking technologists agreed at the 2010 International Workshop on EUV Lithography. Speakers at the just-concluded workshop described steady progress in source power, resist performance, mask defects reduction, line edge roughness (LER) and in addressing other major EUVL challenges. Obert Wood of GlobalFoundries was honored with a Lifetime Achievement Award for his work in pioneering EUVL research, which included a 33-year career at Bell Labs. Also, Lithography
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